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Reduction of CO2 emissions from semiconductor plants As a specific example to achieve the above objectives, Muromachi has introduced efforts to reduce CO2 emissions at the Toshiba Oita Plant and the Sony Semiconductor Kyushu Kagoshima Plant. Toshiba Oita Plant reduced CO2 emissions by 2% by replacing the humidifier with natural evaporation of pure water and heating waste water with waste heat. Sony's Kyushu Kagoshima plant cut CO2 emissions by 17% by using Sony's own custom-built energy-efficient inverters and motors, as well as the cooling water delivery system.
In addition, Muromachi also introduced NEDO (New Energy Industry Technology Development Agency) subsidy business - the development of technology for extracting anhydrous HF (hydrofluoric acid) from fluorine-containing compounds. This technology attempts to use fluorinated compounds to generate HF that is widely used in semiconductor manufacturing to suppress greenhouse gas emissions.
Intel and AMD also delivered a warm speech at the Green IT Forum. The Green IT International Forum placed high hopes on the semiconductor industry and planned the "WSC (WorldSemiconductor Council) special meeting." In addition to Muromachi, WSC Chairman - Taiwan Powerchip Semiconductor Huang Chongren also attended the meeting. The management layer of well-known LSI manufacturers such as Intel and Advanced MicroDevices (AMD) in the United States also delivered a warm speech on Green IT. In the future, environmental issues in the semiconductor industry will also attract attention. 
Environmental protection is one of the most important issues facing Japanese semiconductors
Muromachi pointed out that the purpose of building an environmentally friendly factory in Japan is to achieve three goals. First, CO2 emissions were reduced by 35% in the 20 years from 1990 to 2010. Second, the perfluorinated compounds (PFC: PerFluoroCompound) that cause the greenhouse effect were reduced by 10% in the 15 years from 1995 to 2010. Third, achieve 100% reuse of waste resources.